Smoothing the surfaces of a structure, e.g. to make smooth-edged photo-resists in micro-electronics, involves coating with another material, heating to above the glass transition point of the first material and then cooling

摘要

A method for smoothing the surface of a structure formed from a first material (10) on a base (14) involves coating with a second material (20), heating to above the glass transition point (Tg) of material (10) and then cooling to below the Tg of material (10). A method (M1) for smoothing the surfaces of a structure of a first material (10) with a predetermined first glass transition point (Tg1) on a supporting base (14) involves (a) at least partly coating the surface of (10) with a second material (20) showing a second glass transition point (Tg2), (b) heating (10) to a predetermined temperature (T1) which is higher than Tg1 and (c) cooling (10) to below Tg1. Independent claims are also included for: (1) a method (M2) for smoothing surfaces as above by (a') at least partly coating (10) with a thin layer of a formable release material (26), (b') applying material (20), (c') heating (10) and (20) to a temperature (T1') which is higher than both Tg1 and Tg2, and (d') cooling (10) and (20) to below Tg1; and (2) a method (M3) for smoothing surfaces as above by (a") coating (10) with (20), (b") heating (20) to a temperature (T1") above Tg2 and (c") cooling to below Tg2.