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Method for lapping semiconductor wafers, involves reducing rotational lapping speeds gradually to zero

机译:研磨半导体晶片的方法,涉及将旋转研磨速度逐渐降低至零

摘要

A method for simultaneous two-sided lapping of semiconductor wafers which lie in rotor discs set in rotation by means of annular outer and inner drive gears. At the end of lapping the rotationally speeds of the outer annular gear and of the inner annular gear are gradually reduced to zero. From the point in time at which the speed of the outer annular gear starts to be reduced to stand-still, the upper lapping disc, the lower lapping disc and the inner annular gear and the outer annular gear rotate in the same direction.
机译:一种同时双面研磨半导体晶片的方法,该半导体晶片位于通过环形外部和内部驱动齿轮旋转的转子盘中。在研磨结束时,外环形齿轮和内环形齿轮的转速逐渐减小到零。从外环形齿轮的速度开始减小到停止的时间点,上研磨盘,下研磨盘以及内环形齿轮和外环形齿轮沿相同方向旋转。

著录项

  • 公开/公告号DE102004013467A1

    专利类型

  • 公开/公告日2005-10-06

    原文格式PDF

  • 申请/专利权人 SILTRONIC AG;

    申请/专利号DE20041013467

  • 发明设计人 KOBLER KARL;RIEGER ALEXANDER;DUMM HERMANN;

    申请日2004-03-18

  • 分类号B24B37/04;H01L21/304;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:52

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