首页> 外国专利> Intensifying pulsed magnetron discharge in a vacuum chamber comprises deflecting an additional electron stream from an additional electron source to a first electrode so that ions are formed in the region of the electrode

Intensifying pulsed magnetron discharge in a vacuum chamber comprises deflecting an additional electron stream from an additional electron source to a first electrode so that ions are formed in the region of the electrode

机译:在真空室中增强脉冲磁控管放电包括将来自附加电子源的附加电子流偏转到第一电极,以便在电极区域中形成离子

摘要

Intensifying a pulsed magnetron discharge in a vacuum chamber (3) comprises deflecting an additional electron stream from an additional electron source (9) to a first electrode (1) for a part of each time period, in which the first electrode is operated non cathodically, so that ions are formed in the region of the first electrode. An independent claim is also included for a device for operating a pulsed magnetron discharge in a vacuum chamber. Preferred Features: The first electrode alternates as a cathode or anode. A hollow cathode is used as the additional electron source. A thin layer is formed on a substrate using magnetron sputtering.
机译:在真空室(3)中增强脉冲磁控管放电包括在每个时间段的一部分时间内,将来自附加电子源(9)的附加电子流偏转到第一电极(1),其中第一电极非阴极地工作,从而在第一电极的区域中形成离子。还包括用于操作真空室中的脉冲磁控管放电的装置的独立权利要求。优选特征:第一电极交替作为阴极或阳极。中空阴极用作附加电子源。使用磁控溅射在基板上形成薄层。

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