首页> 外国专利> Sputter target for target base plate in vacuum coating unit has oval shape with central aperture and inner and outer peripheral grooves in which locking strips are positioned, bores above groove allowing base plate to be bolted to it

Sputter target for target base plate in vacuum coating unit has oval shape with central aperture and inner and outer peripheral grooves in which locking strips are positioned, bores above groove allowing base plate to be bolted to it

机译:真空镀膜单元中靶基板的溅射靶呈椭圆形,具有中心孔和内,外槽,在槽中设有锁定条,槽上方的孔允许将基板螺栓连接到该靶上。

摘要

Sputter target (12) for a target base plate (14) in a vacuum coating unit has an oval shape with a central aperture. It has inner and outer peripheral grooves (30, 32) in which locking strips (24) are positioned. Bores above the groove allow the base plate to be fastened to it by bolts (16).
机译:用于真空涂覆单元中的靶基板(14)的溅射靶(12)为具有中心孔的椭圆形。它具有内周和外周凹槽(30、32),锁定条(24)位于其中。凹槽上方的镗孔使基板可以通过螺栓(16)固定在基板上。

著录项

  • 公开/公告号DE202005011974U1

    专利类型

  • 公开/公告日2005-10-13

    原文格式PDF

  • 申请/专利权人 HENSEL KARL;

    申请/专利号DE20052011974U

  • 发明设计人

    申请日2005-07-27

  • 分类号C23C14/34;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:08

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