首页> 外国专利> Process for cleaning a process bath comprises evaporating a part of the process bath used in the process until phase separation into a lower phase, a middle phase and an upper phase occurs, and removing the upper and lower phases

Process for cleaning a process bath comprises evaporating a part of the process bath used in the process until phase separation into a lower phase, a middle phase and an upper phase occurs, and removing the upper and lower phases

机译:清洁工艺浴的方法包括蒸发该工艺中使用的部分工艺浴,直到发生相分离成下相,中间相和上相,并除去上相和下相

摘要

Process for cleaning a process bath, especially for cleaning a Zn/Ni-electrolyte bath for a galvanic process, comprises evaporating a part of the process bath used in the process until phase separation into a lower phase, a middle phase and an upper phase occurs, and removing the upper and lower phases. An independent claim is also included for a device for cleaning a process bath, especially for cleaning a Zn/Ni-electrolyte of a galvanic process, comprising a unit (2) for evaporating the process bath and/or rinsing water after the process bath, and a unit (4) for removing the phases of the process bath and/or the rinsing bath.
机译:清洁工艺浴,特别是用于电镀工艺的Zn / Ni电解质浴的清洁方法,包括蒸发该工艺中使用的部分工艺浴,直到发生相分离成下相,中间相和上相,并删除上,下阶段。还包括用于清洗工艺槽,特别是用于清洗电镀工艺的Zn / Ni电解质的设备的独立权利要求,其包括用于蒸发工艺槽和/或在工艺槽后冲洗水的单元(2),单元(4),用于除去工艺浴和/或漂洗浴的相。

著录项

  • 公开/公告号DE20320939U1

    专利类型

  • 公开/公告日2005-07-14

    原文格式PDF

  • 申请/专利权人 GOEMA GMBH;

    申请/专利号DE2003220939U

  • 发明设计人

    申请日2003-06-06

  • 分类号C25D21/16;C25D21/20;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:03

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