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method for cleaning a porous surface of a halbleitersubstrats
method for cleaning a porous surface of a halbleitersubstrats
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机译:清洗半缩醛基质的多孔表面的方法
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摘要
Provided is a suitable cleaning method of porous semiconductor substrate without occurrence of collapse of porous structure due to cavitation or resonance. In a cleaning method of porous surface of semiconductor substrate having the porous structure at least in the surface, cleaning for removing dust particles adhering to the porous surface of the substrate takes place with pure water on which a high-frequency wave with a frequency in the range of from 600 kHz to 2 MHz is superimposed. IMAGE
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