It is an isolation trench dug in a semi - conductive substrate (1) comprising the sides (2) and a bottom (3). On the sides (2) are added to the spacers (7), they are intended to create a channel (14) is reduced between the sides (2). The bottom (3) and the spacers (7) are covered with an electrically insulating material (8), delimiting a cavity closed vacuum (9). Application to the manufacture of integrated circuits.
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