ONIUM SALT, RADIATION-SENSITIVE ACID GENERATOR USING THE SAME, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a resist material capable of realizing such high resolution as to be capable of coping with the recent increased fineness of resist patterning.;SOLUTION: The onium salt is represented by formula (1) (wherein A is a sulfur atom or an iodine atom; Ar¹ and Ar² are each an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; B is a divalent functional group or a divalent atom; R¹ and R² are each a hydrogen atom, an alkyl group, an alicyclic group, an aromatic hydrocarbon group, or a heterocyclic hydrocarbon group; Y^- is a non-nucleophilic counterion; and Z¹ and Z² are each an oxygen atom or a sulfur atom).;COPYRIGHT: (C)2007,JPO&INPIT