METHOD AND APPARATUS FOR IONIZING CLUSTER, AND METHOD FOR FORMING FILM USING CLUSTER IONIZED THEREBY, ETCHING METHOD, SURFACE MODIFICATION METHOD AND CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for ionizing cluster capable of increasing the energy per atom constituting the cluster without changing the acceleration voltage when accelerating cluster ions in manufacturing elements or the like, and a method for forming a film using the cluster ionized thereby, an etching method, a surface modification method and a cleaning method.;SOLUTION: In the method and the apparatus for ionizing cluster, a cluster ion beam source 5 is included, the cluster ion beam source has a wavelength control mechanism (diffraction grating, aperture slit) capable of controlling the wavelength of the light irradiated on the cluster in a wavelength range having the energy to cause ionization by inner shell electron, and the cluster is ionized in multivalent manner by utilizing Auger process.;COPYRIGHT: (C)2006,JPO&NCIPI