FILTER SYSTEM FOR FILTERING PARTICLES OUT OF RADIATION EMITTED BY RADIATION SOURCE, APPARATUS HAVING RADIATION SOURCE, FILTER SYSTEM FOR FILTERING PARTICLES OUT OF RADIATION EMITTED BY RADIATION SOURCE, AND PROCESSING SYSTEM FOR PROCESSING RADIATION, LITHOGRAPHIC APPARATUS HAVING SUCH APPARATUS, AND METHOD OF FILTERING PARTICLES OUT OF RADIATION EMITTED FROM RADIATION SOURCE AND PROPAGATING

摘要

PROBLEM TO BE SOLVED: To provide a filter system for removing or minimizing debris particles within a radiation, a lithographic apparatus equipped with such a system, and a method for filtering the particles out of the radiation.;SOLUTION: The particles, which are emitted by a radiation source 2 and are moving from the radiation source 2 towards a processing system for processing a radiation 8 from the radiation source 2, are filtered out of the radiation 8 propagating through a predetermined cross section of the radiation 8 as emitted by the radiation source 2 by a filter system 6. The filter system 6 includes a plurality of foils 14 and a transporter 11 for transporting the foils 14 along a trajectory which extends within a beam so that the foils 14 intercept the particles within the beam. The transporter 11 is arranged to transport the foils 14 by a substantially translatory movement of the foils 14 along at least a part of the trajectory.;COPYRIGHT: (C)2006,JPO&NCIPI