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IMPROVED METHOD OF FORMING BOTTOM-GATE THIN-FILM TRANSISTOR BY USING BLENDED SOLUTION TO FORM SEMICONDUCTOR LAYER AND INSULATING LAYER
IMPROVED METHOD OF FORMING BOTTOM-GATE THIN-FILM TRANSISTOR BY USING BLENDED SOLUTION TO FORM SEMICONDUCTOR LAYER AND INSULATING LAYER
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机译:通过混合溶液形成半导体层和绝缘层的改进方法来形成底部栅极薄膜晶体管
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摘要
PROBLEM TO BE SOLVED: To form a polymer layer and seal the layer in an electronic device.;SOLUTION: In a method of forming a semiconductive polymer layer protected by an insulating polymer layer, materials for forming a semiconductive polymer and an insulating polymer are dissolved in a solvent. When a blended solution is deposited on a substrate, the semiconductive polymer and the insulating polymer are separated. When the solvent is vaporized, a semiconductive material forms an active area of a TFT and the insulating polymer minimizes the exposure of the semiconductive polymer to the air.;COPYRIGHT: (C)2006,JPO&NCIPI
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