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SUBSTRATE, MINUTE STRUCTURE, REFERENCE SCALE MANUFACTURING METHOD, AND MINUTE STRUCTURE LENGTH MEASURING METHOD

机译:基板,微小结构,参考比例尺制造方法和微小结构长度测量方法

摘要

PROBLEM TO BE SOLVED: To precisely and easily perform length measurement irrespective of the posture of a length measuring object.;SOLUTION: This substrate 2 is equipped with a substrate body 5 with a measuring object 3 formed on its surface 5a, and a reference scale 6 provided on the surface 5a of the substrate body 5 so as to extend at least in one direction in the vicinity of an area with the measuring object 3 formed therein. The reference scale 6 has a plurality of graduations 7 formed by utilizing a focused ion beam (FIB) and disposed next to each other at predetermined intervals.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:精确且容易地进行长度测量而与长度测量对象的姿势无关。解决方案:该基板2配备有在其表面5a上形成有测量对象3的基板主体5和基准尺。在基板主体5的表面5a上设置有如图6所示的基板,以在形成有被测物3的区域附近至少沿一个方向延伸。参考刻度6具有多个刻度7,这些刻度通过利用聚焦离子束(FIB)形成并且以预定间隔彼此相邻地布置。版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006220560A

    专利类型

  • 公开/公告日2006-08-24

    原文格式PDF

  • 申请/专利权人 SII NANOTECHNOLOGY INC;

    申请/专利号JP20050034730

  • 发明设计人 MUNEKANE MASANAO;TASHIRO JUNICHI;

    申请日2005-02-10

  • 分类号G01B9/04;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 21:55:53

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