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DEFECT CORRECTION DEVICE FOR PATTERN SUBSTRATE, DEFECT CORRECTION METHOD THEREFOR, AND METHOD OF MANUFACTURING PATTERN SUBSTRATE
DEFECT CORRECTION DEVICE FOR PATTERN SUBSTRATE, DEFECT CORRECTION METHOD THEREFOR, AND METHOD OF MANUFACTURING PATTERN SUBSTRATE
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机译:图案基质的缺陷校正装置,其缺陷修正方法以及制造图案基质的方法
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摘要
PROBLEM TO BE SOLVED: To provide a defect correction method for pattern substrate and a defect correction device therefor for improving the productivity, and to provide a method of manufacturing the pattern substrate using the defect correction method for the pattern substrate.;SOLUTION: The defect correction device is provided with: a mask film reel 8 on which a mask film 5 to be arranged opposite to a substrate 6 is wound; transfer film loaders 21 which supply a piece of transfer film; and a repair head 35 movably disposed. Therein, a film holder 42 which holds the piece of the transfer film 18 and a laser beam source 1 which emits laser beam for forming an opening on the mask film 5 are disposed on the repair head 35, the repair head 35 is moved so that the film holder 42 is located at a position corresponding to the opening, the piece of the transfer film 18 is arranged above the opening disposed on the mask film 5 and the transfer layer of the transfer film 18 is transferred to the substrate via the opening of the mask film 5.;COPYRIGHT: (C)2007,JPO&INPIT
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