首页> 外国专利> MEASURING APPARATUS AND MEASUREMENT METHOD OF COMPLEX DIELECTRIC CONSTANT IN SAMPLE BY MEASURING REFLECTION OF LIGHT

MEASURING APPARATUS AND MEASUREMENT METHOD OF COMPLEX DIELECTRIC CONSTANT IN SAMPLE BY MEASURING REFLECTION OF LIGHT

机译:样品中光的反射率测定方法及样品中复介电常数的测定方法

摘要

PROBLEM TO BE SOLVED: To realize an optical system for measuring the complex dielectric constant of a thin film on a substrate by measuring the reflection spectrum of a sample.;SOLUTION: The reflection spectrum of a parallel flat plate-shaped substrate has the constant and minimum reflection factor regardless of an incident angle at the bottom frequency of a fringe, but the reflection factor increases and approaches 1 by increasing the incident angle at the peripheral frequency. When a thin film is placed on the substrate and the thickness is increased, the bottom frequency of the fringe is shifted to a low-frequency side. The spectrum (relative reflection spectrum) of the ratio of the reflection spectrum in a system comprising a substrate and a thin film to the reflection spectrum of only the substrate shows a structure in which the minimum and maximum values are adjacent due to the three effects, thus obtaining the complex dielectric constant of the thin film by analyzing the relative reflection spectrum.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:通过测量样品的反射光谱来实现一种用于测量薄膜在薄膜上的复介电常数的光学系统。解决方案:平行平板状基板的反射光谱具有常数和最小反射率与条纹底部频率处的入射角无关,但反射率会通过增加外围频率处的入射角而增加并接近1。当在基板上放置薄膜并增加厚度时,条纹的底部频率移至低频侧。包括基板和薄膜的系统中的反射光谱与仅基板的反射光谱之比的光谱(相对反射光谱)显示出由于三种效应,最小值和最大值相邻的结构,从而通过分析相对反射光谱获得薄膜的复介电常数。;版权所有:(C)2006,日本特许厅

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