METHOD FOR MEASURING MISALIGNMENT BETWEEN TOP AND BACK PATTERN OF DOUBLE-FACE MASK, AND METHOD FOR PREPARING DOUBLE-FACE MASK

摘要

PROBLEM TO BE SOLVED: To provide a method for measuring misalignment between patterns on both surfaces of a double-face mask with high accuracy, and to provide a method for preparing a double-face mask having a top-surface pattern and a back-surface pattern superposed with high accuracy, using this measurement method.;SOLUTION: The method for measuring misalignment between a pattern on one surface from a pattern on the other surface of a double-face mask is carried out, by measuring the coordinate of the position of a predetermined pattern for measurement on the other surface from a predetermined opening for measurement in a pattern of one surface through a transparent substrate, and calculating the rotation component and the orthogonal coordinate components of the misalignment, from the difference between the coordinates of the position which should originally existed by the design of the pattern for measurement and the coordinates of the position of the pattern actually measured.;COPYRIGHT: (C)2006,JPO&NCIPI