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ELECTRON BEAM PROBE MICRO X-RAY ANALYTICAL METHOD, AND ANALYZER THEREFOR

机译:电子束探针微X射线分析方法及其分析仪

摘要

PROBLEM TO BE SOLVED: To provide an electron beam probe micro X-ray analytical method capable of analyzing a depth-directional element distribution from a surface of an analyzed sample.;SOLUTION: In this electron beam probe micro X-ray analytical method of the present invention for irradiating the surface of the analyzed sample 5 with an electron beam 2, and for measuring an intensity of a characteristic X-ray induction-output from the surface of the analyzed sample 5 by the electron beam 2, an angle of the measuring characteristic X-ray is changed within a prescribed range, with respect to the surface of the analyzed sample 5, the characteristic X-rays are measured at the plurality of angles, and an element of the analyzed sample 5 is analyzed based on the intensity measured in each of the angles.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种电子束探针显微X射线分析方法,该方法能够分析被分析样品表面的深度方向元素分布。解决方案:在该电子束探针显微X射线分析方法中用于用电子束2照射被分析样品5的表面的本发明,以及用于测量通过电子束2从被分析样品5的表面输出的特征X射线感应强度的测量角度。在规定范围内改变特征X射线,相对于被分析样品5的表面,以多个角度测量特征X射线,并基于所测量的强度来分析被分析样品5的元素。 COPYRIGHT:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006017673A

    专利类型

  • 公开/公告日2006-01-19

    原文格式PDF

  • 申请/专利权人 SHARP CORP;

    申请/专利号JP20040198258

  • 发明设计人 FURUKAWA MASAKI;

    申请日2004-07-05

  • 分类号G01N23/225;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 21:55:26

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