METHOD OF SURFACE TREATMENT, APPARATUS FOR SURFACE TREATMENT, METHOD OF FORMING ANTIGLARE LAYER, ANTIGLARE FILM AND ANTIGLARE LOW REFLECTION FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of surface treatment by which an antiglare layer is formed with a short processing time without necessitating a complicated process, an apparatus for plasma discharge treatment, an antiglare film and an antiglare low reflection film formed by the method of surface treatment and the apparatus for plasma discharge treatment.;SOLUTION: The method of surface treatment comprises forming irregularities and gaps on the surface of a material to be treated by treating the surface of the material having a heterogeneous composition attributable to more than one kind of substance having a different plasma resistivity present at least near the surface with an atmospheric plasma discharge treatment in which a material surface is exposed to a plasmatic mixed gas containing nitrogen gas and a reactive gas under an atmospheric pressure or a pressure near to it.;COPYRIGHT: (C)2007,JPO&INPIT