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SYSTEM AND METHOD FOR MOTION AND ANGULATION PROFILES IN TOMOSYNTHESIS

机译:断层合成中运动和成角轮廓的系统和方法

摘要

PPROBLEM TO BE SOLVED: To provide a system and method for adjusting an X-ray beam according to movement of the X-ray source, as regards tomosynthesis, generally, and more specifically, as regards angulation profiles and motion profiles in a tomosynthesis system. PSOLUTION: A method (500) for improved motion and angulation profiles in tomosynthesis includes designating a target (12) with a first (16) and second dimension. An x-ray beam (18) is projected onto at least a portion of the target (12). The x-ray beam (18) has an origin (80) with a position (58) along the first dimension (16). The x-ray beam (18) also has a beam axis (34), a projection area (28), and an angle (20, 40) representative of an angular distance between the beam axis (34) and the at least a portion of the target (12). The method (500) further includes a step of varying the angle (20, 40) based at least in part on the position (58) of the origin (80) along the first dimension (16). The angle (20, 40) is varied to substantially maintain the projection area (28). PCOPYRIGHT: (C)2007,JPO&INPIT
机译:

要解决的问题:提供一种用于根据X射线源的运动来调整X射线束的系统和方法,所述X射线束通常关于断层合成,并且更具体而言,关于X射线源的角度分布和运动分布断层合成系统。解决方案:用于在断层合成中改善运动和角度分布轮廓的方法(500)包括指定具有第一尺寸(16)和第二尺寸的目标(12)。 X射线束(18)被投射到目标(12)的至少一部分上。 X射线束(18)具有原点(80),该原点(80)具有沿着第一尺寸(16)的位置(58)。 X射线束(18)还具有束轴(34),投影区域(28)和表示束轴(34)与至少一部分之间的角距离的角度(20、40)。目标(12)。方法(500)还包括至少部分基于沿第一尺寸(16)的原点(80)的位置(58)来改变角度(20、40)的步骤。改变角度(20、40)以基本保持投影区域(28)。

版权:(C)2007,日本特许厅&INPIT

著录项

  • 公开/公告号JP2006263466A

    专利类型

  • 公开/公告日2006-10-05

    原文格式PDF

  • 申请/专利权人 GENERAL ELECTRIC CO GE;

    申请/专利号JP20060071997

  • 发明设计人 NI XIANFENG;LI BAOJUN;ZHANG XU;

    申请日2006-03-16

  • 分类号A61B6/02;

  • 国家 JP

  • 入库时间 2022-08-21 21:54:24

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