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MANUFACTURING METHOD FOR THIN-FILM LAMINATED STRUCTURE, THIN-FILM LAMINATED STRUCTURE, FUNCTION ELEMENT, MANUFACTURING METHOD FOR FUNCTION ELEMENT, AND MANUFACTURING DEVICE OF THIN-FILM LAMINATED STRUCTURE AND HETEROSTRUCTURE
MANUFACTURING METHOD FOR THIN-FILM LAMINATED STRUCTURE, THIN-FILM LAMINATED STRUCTURE, FUNCTION ELEMENT, MANUFACTURING METHOD FOR FUNCTION ELEMENT, AND MANUFACTURING DEVICE OF THIN-FILM LAMINATED STRUCTURE AND HETEROSTRUCTURE
PROBLEM TO BE SOLVED: To provide a thin-film laminated structure suitable for using for manufacture of a high-functional function element, which can make the best possible use of advantages of a bottom up system and a top down system, and to provide a manufacturing method therefor.;SOLUTION: The integrated thin-film laminated structure is manufactured by depositing thin films in a non-reciprocal process while rotating a cylindrical or polygonal column substrate 53. The thickness of the thin film is, for example, 1,000 nm or less. Deposition of the thin films is performed by the LB (Langmuir Brojet) method or an alternating adsorption method. Monomolecular films are deposited as the thin films in the LB method. A functional element such as a memory element and a solar cell is constituted using the thin-film laminated structure.;COPYRIGHT: (C)2006,JPO&NCIPI
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