首页> 外国专利> SEMICONDUCTOR LIGHT EMITTING ELEMENT, SURFACE EMISSION SEMICONDUCTOR LASER, SURFACE EMISSION SEMICONDUCTOR LASER ARRAY, OPTICAL TRANSMISSION MODULE, OPTICAL TRANSMISSION/RECEPTION MODULE, AND OPTICAL COMMUNICATION SYSTEM

SEMICONDUCTOR LIGHT EMITTING ELEMENT, SURFACE EMISSION SEMICONDUCTOR LASER, SURFACE EMISSION SEMICONDUCTOR LASER ARRAY, OPTICAL TRANSMISSION MODULE, OPTICAL TRANSMISSION/RECEPTION MODULE, AND OPTICAL COMMUNICATION SYSTEM

机译:半导体发光元件,表面发射激光,表面发射半导体激光阵列,光学传输模块,光学传输/接收模块和光学通信系统

摘要

PPROBLEM TO BE SOLVED: To lower the threshold by preventing an increase in a threshold current in a semiconductor light emitting element employing a quantum well active layer, and a barrier layer containing nitrogen (N) and other group V element simultaneously just like the quantum well active layer. PSOLUTION: In the semiconductor light emitting element having a quantum well active layer 9 containing nitrogen and other group V element simultaneously, and an active layer 5 consisting of underlying and overlying barrier layers 10a and 10c; the barrier layers 10a and 10c contain nitrogen and other group V element simultaneously just like the quantum well active layer 9. Since only the N composition of the underlying barrier layer 10a having significant effect on the crystallinity of the quantum well active layer 9 is decreased and the N composition of the overlying barrier layer 10c having insignificant effect is increased relatively, adverse effect of the underlying layer is reduced during the growth of the quantum well active layer 9 while sustaining the effect of adding nitrogen (N) to the barrier layers 10a and 10c. N composition of the quantum well active layer 9 can be reduced as compared with a case where both overlying and underlying layers have a small N composition and operation with an extremely low threshold can be realized. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:通过防止在采用量子阱有源层的半导体发光元件中同时降低阈值电流来降低阈值,该阻挡层同时包含氮(N)和其他V组元素量子阱活性层。

解决方案:在半导体发光元件中,该半导体发光元件具有同时包含氮和其他V族元素的量子阱活性层9,以及由下面和上面的势垒层10a和10c组成的活性层5;势垒层10a和10c与量子阱活性层9一样,同时含有氮和其他V族元素。由于仅对量子阱活性层9的结晶性产生重大影响的下层势垒层10a的N组成减少,具有微不足道作用的上层势垒层10c的N组成相对增加,在量子阱活性层9的生长期间,下层的不利影响减小,同时维持了向势垒层10a和10b中添加氮(N)的作用。 10分。与上层和下层两者具有小的N组成并且可以实现具有极低阈值的操作的情况相比,可以减少量子阱活性层9的N组成。

版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006032780A

    专利类型

  • 公开/公告日2006-02-02

    原文格式PDF

  • 申请/专利权人 RICOH CO LTD;

    申请/专利号JP20040211664

  • 申请日2004-07-20

  • 分类号H01S5/343;H01S5/183;

  • 国家 JP

  • 入库时间 2022-08-21 21:52:45

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