The picture formation characteristic element which is based on the radiation sensitivity composition, and the said composition which include the okisazoru derivative

摘要

(A) each one includes the ethylene unsaturated type basis of one or more which the free radical is easy to be polymerized, or more the monomer of type of 1 kinds or 2 kinds and/or the oligomer and/or the polymer, (b) the sensitizer of one or more, (c) said sensitizer (b) with it to be possible to form the free radical together, and the chemical compound of the below-mentioned class: Metallocene and 1 - three CX₃ bases (X displays chlorine or bromine) 1,3,5 where it possesses - the triazine derivative; Peroxide; hekisaarirubiimidazoru; Oxime ether; Oxime ester; N-ariru glycine and these derivatives; Thiol compound; Being N-ariru, S-ariru and the O-ariru poly- carboxylic acid which possess the carboxyl group of two or more, one or more among the said carboxyl groups, N of the said aryl unit, those which are connected to the S or O atom; arukirutoriariruboreto; Benzoin ether; Benzoin ester; toriharogenomechiruarirusuruhon; Amine; N, N-jiarukiruamino benzoate; Aromatic sulfonyl halide; toriharogenomechirusuruhon; Imido; jiazosuruhoneto; 9,10 - dihydroanthracene derivative; Is selected from -hidorokishi and the -amino acetophenone also those of one or more which the initiator, and (d) the alkaline solubility binder, the colorant, the exposure indicator, the plasticizer and the chain transfer agent, the leuco pigment, the surface active agent, are selected from the inorganic bulking agent and the heat polymerization inhibiter includes or more which the option selective component of 1 kinds or 2 kinds being the radiation sensitivity composition which, the sensitizer of the said one or more formula (i)[In the above-mentioned formula, respective R¹, as for R² and R³ becoming independent, the aralkyl basis and the basis which are substituted the aryl basis which is substituted the alkyl group which is substituted the halogen atom, according to need, according to need (it is possible to be condensed), according to need - NR⁴ R⁵ and the basis - OR⁶ (here, R⁴ and R⁵ becoming independent, the hydrogen atom, alkyl, is selected from the aryl or aralkyl basis, R⁶ alkyl, is the aryl or aralkyl basis, or the hydrogen atom) from to be selected, and k, as for m and n independenceDoing, integer of 0 or 1 - 5 is] the radiation sensitivity composition which features that it is the okisazoru derivative.