首页> 外国专利> Composition sensitive to radiation, the radiation sensitive element, a process to form an image on an element sensitive to radiation, converted into picture element, process for producing an element sensitive to radiation, and use of a composition sensitive to radiation.

Composition sensitive to radiation, the radiation sensitive element, a process to form an image on an element sensitive to radiation, converted into picture element, process for producing an element sensitive to radiation, and use of a composition sensitive to radiation.

机译:对放射线敏感的组合物,放射线敏感元件,在对放射线敏感的元件上形成图像的过程,被转换为图像元素,用于生产对放射线敏感的元件的过程以及对放射线敏感的组合物的用途。

摘要

Composition sensitive to radiation, the radiation sensitive element, a process to form an image on an element sensitive to radiation, the element is converted into the image.Process for producing an element sensitive to radiation, and use of a composition sensitive to radiation.The element sensitive to radiation, comprising: (a) one or more kinds of monomers each comprising at least an unsaturated group etilenicamente accessible by a free radical polymerisation.(b) at least one sensitizer.(c) at least one co initiator capable of forming free radicals with the sensitizer (b) and selected the following classes of compounds: metalocenos; derivatives of 1.3.5 - triazine with a three groups CX ~ 3 ~.In which X represents chlorine or bromine; peroxides; hexaarilbiimidazu00f3is; oxime ethers; oxime esters; N - arilglicinas and its derivatives; thiol compounds; acid N - aril.S - aril and - aril polycarboxylic with at least 2 carboxyl groups, at least one of which is connected to the atom n,S or the unit arila; alquiltriarilboratos; ethers benzou00ednicos benzou00ednicos; esters; tri - halogenometilarilsulfonas; amines; acid esters n,N - dialquilaminobenzu00f3ico; sulfonyl aromatic halides; tri - halogenometilsulfonas imides; diazossulfonatos; derivatives; 9.10 - diidroantraceno; 244 and - 244 - hydroxy amino acetophenones; and (d) optionally one or more components selected from alkali soluble binders, colorants, indicators of exposure.Plasticizers, transfer agents in the chain leucocorantes, surfactants.Inorganic fillers and inhibitors of termopolimerizau00e7u00e3o characterized in that at least a sensitizer is a derivative of the formula (1) oxazol, in which each ru00ac 1u00ac,Ru00ac 2u00ac and ru00ac 3u00ac is independently selected from a halogen atom, an optionally substituted alkyl group, a group arila optionally replaced, which can also be fused.A group aralquila optionally replaced, a group nru00ac 4u00ac ru00ac 5u00ac and a group oru00ac 6u00ac, in which ru00ac 4u00ac and ru00ac 5u00ac are independently selected from a hydrogen atom, an alkyl group,Arila or aralquila, ru00ac 6u00ac is an alkyl group, arila or aralquila or a hydrogen atom, and (k, m and N are independently o or an integer of 1 to 5.
机译:对辐射敏感的组合物,辐射敏感元素,在对辐射敏感的元素上形成图像的过程,该元素被转换为图像。生产对辐射敏感的元素的过程,以及对辐射敏感的组合物的使用。对辐射敏感的元素,包括:(a)一种或多种单体,每个单体至少包含可通过自由基聚合反应获得的至少一种不饱和的etilenicamente。(b)至少一种敏化剂。(c)至少一种能够形成的共引发剂含敏化剂(b)的自由基,并选择以下类型的化合物:金属元素; 1.3.5-三嗪的衍生物,具有三个基团CX〜3〜。其中X表示氯或溴;过氧化物hexaarilbiimidaz u00f3is;肟醚;肟酯; N-arilglicinas及其衍生物;硫醇化合物酸N-芳烃.S-芳烃和-含至少两个羧基的芳烃多元羧酸,其中至少一个与原子n,S或芳基单元相连; alquiltriarilboratos;醚苯并苯二酚;酯三-卤代甲硫脲;胺;酸酯n,N-二烯基氨基苯 u00f3ico;磺酰芳族卤化物;三卤代亚磺酰亚胺;重氮磺酸钠;衍生品9.10-diidroantraceno; <244>和<>-244-羟基氨基苯乙酮; (e)增白剂,链白带中的转移剂,表面活性剂。术语Termolipolimeriza的无机填充剂和抑制剂,其特征在于,至少一种敏化剂为式(1)恶唑的衍生物,其中每个r u00ac 1 u00ac,R u00ac 2 u00ac和r u00ac 3 u00ac各自独立地选自卤素原子,任选取代的烷基,芳基可选替换的aralquila组,可选的nr u00ac 4 u00ac r u00ac 5 u00ac组,或group or u00ac 6 u00ac,其中r u00ac 4 u00ac和r u00ac 5 u00ac独立地选自氢原子,烷基,芳基或芳基,r u00ac 6 u00ac是烷基,芳基或芳基或氢原子,并且(k,m和N独立地为o或1到5的整数。

著录项

  • 公开/公告号BRPI0407697B1

    专利类型

  • 公开/公告日2012-05-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号BR2004PI07697

  • 申请日2004-02-20

  • 分类号G03F7/031;G03F;G03F7/028;G03F7/029;

  • 国家 BR

  • 入库时间 2022-08-21 17:25:31

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