PLASMA CVD SYSTEM, AND METHOD FOR MANUFACTURING HARD CARBON FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently manufacturing a hard carbon film on a substrate such as a silicon substrate.;SOLUTION: The hard carbon film manufacturing method comprises: a step of arranging a work 3 in a reaction container 2, a step of arranging magnets 15a, 15b on a back side of the work 3 arranged in the reaction container, and of locally forming the magnetic field on the face side of the work 3 and in a vicinity thereof; and a step of introducing raw material gas in the reaction container 2 and generating plasma in the reaction container 2.;COPYRIGHT: (C)2006,JPO&NCIPI