PRODUCTION METHOD FOR MASK BLANK-USE TRANSLUCENT SUBSTRATE, PRODUCTION METHOD FOR MASK BLANK, PRODUCTION METHOD FOR EXPOSING MASK, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE AND PRODUCTION METHOD FOR LIQUID CRYSTAL DISPLAY UNIT, AND METHOD OF CORRECTING DEFECT IN EXPOSING MASK

摘要

PROBLEM TO BE SOLVED: To provide a production method for a mask blank-use translucent substrate, a mask blank and an exposing mask to prevent occurrence of a transfer pattern defect and a mask pattern defect by correcting a recessed defect on the surface of a translucent substrate, and to provide a method of correcting a defect in an exposing mask.;SOLUTION: The exposing mask has mask patterns 2 as transfer patterns formed on a translucent substrate 1, wherein the surrounding portion of a recessed defect 3, in a substrate surface 1a where a mask pattern 2 is not formed, that causes reduction in transmitted light quantity leading to a transfer pattern defect is removed by a needle-like member 4, and a correction is made so as to reduce the step difference between the substrate surface and the recessed defect depth. Such a recessed defect is corrected before the stage of forming a mask pattern-forming thin film on the translucent substrate. Then the recessed defect-corrected translucent substrate is used to produce a mask blank and an exposing mask.;COPYRIGHT: (C)2006,JPO&NCIPI