首页> 外国专利> Changing the heat sensitive material for lithography formation, production manner of the edition material and the edition material,

Changing the heat sensitive material for lithography formation, production manner of the edition material and the edition material,

机译:改变用于光刻形成的热敏材料,版材和版材的生产方式,

摘要

PROBLEM TO BE SOLVED: To improve sensitivity to heat in plate-making in a heat-sensitive type form plate material capable of obtaining a lithography which is excellent in plate wear without requiring a developing process. ;SOLUTION: A heat-sensitive layer 2 wherein a fine particle 4 is uniformly distributed in polyacrylic acid 3 is formed on a substrate 1. The fine particle 4 comprises a micro-capsule 41 and a lipophyllic component 42 contained in the micro-capsule 41. Polyvinyl alcohol-polyvinyl acetate copolymer is added to a part 21 to an at least form plate surface side of the heat-sensitive layer 2.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:在不需要显影处理的情况下,在能够获得优异的版版磨损性的光刻的热敏型模板材料中,提高制版中对热的敏感性。 ;解决方案:在基板1上形成热敏层2,其中细颗粒4均匀地分布在聚丙烯酸3中。细颗粒4包括微囊41和包含在微囊41中的脂质体组分42。将聚乙烯醇-聚乙酸乙烯酯共聚物添加到至少部分热敏层2的板表面侧的部分21中; COPYRIGHT:(C)2001,JPO

著录项

  • 公开/公告号JP3819182B2

    专利类型

  • 公开/公告日2006-09-06

    原文格式PDF

  • 申请/专利权人 富士写真フイルム株式会社;

    申请/专利号JP19990236908

  • 发明设计人 井出 陽一郎;

    申请日1999-08-24

  • 分类号B41N1/14;

  • 国家 JP

  • 入库时间 2022-08-21 21:50:08

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