Acid resisting coating and the deyuarudamashin filling up composition which include styrene - allyl alcoholic copolymer

摘要

The acid resisting new it has possessed the flow quality which is improved or filling up composition was offered. As for the composition, the styrene - allyl alcoholic polymer and, desirably for example at least in addition to the styrene allyl alcoholic polymer one another polymer (the cellulose polymer) with it includes. As for the composition of this invention, it is used in order to protect from disassembly during etching in the deyuarudamashin process which continuously is done the contact hole or the beer hole. For example the composition of this invention acid resisting coating layer (continuously decreases the exposure of the photoresist which is done and the reflection during development evades) the baseplate in order to form (, the silicon wafer) vis-a-vis it can be applied.