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Photosensitive resin composition for planographic printing edition and basic plate for planographic printing

机译:平版印刷版用光敏树脂组合物和平版印刷用基板

摘要

In the photosensitive resin composition for planographic printing edition, the hydrophilic polymer which at least possesses the hydrophilic basis 10 weight % above 90 weight % below and inside the molecule of the hydrophilic polymer and/or the chemical compound which obstructs the hydrogen bond between the molecules 0.5 weight % above 20 weight % below it regards the photosensitive resin composition for planographic printing edition which features that it contains vis-a-vis the hydrophilic polymer. In addition, as for the basic plate for planographic printing, the hydrophilic polymer which at least possesses the hydrophilic basis 10 weight % above 90 weight % below and inside the molecule of the hydrophilic polymer and/or the chemical compound which obstructs the hydrogen bond between the molecules 0.5 weight % above 20 weight % below the photosensitive resin composition which is contained building a bridge vis-a-vis the hydrophilic polymer, it is desirable to possess the hydrophilic resin exposure to light layer which becomes. It can handle in the discernment room, development and wiping off operation is unnecessary, at the same time it is superior in hydrophily, decreases the quantity of the wetting water and it offers the basic plate for CTP which greasing it is difficult to do.
机译:在平版印刷版的光敏树脂组合物中,亲水性聚合物和/或阻碍分子间氢键的化合物在分子内和分子内至少具有高于90wt%以下10wt%的亲水基础。高于0.5重量%低于20重量%是用于平版印刷版的光敏树脂组合物,其特征在于相对于亲水性聚合物包含。另外,对于平版印刷用基板,亲水性聚合物和/或阻碍氢键之间的氢键的化合物在分子内和分子内至少90重量%以上至少具有10重量%的亲水性基础的亲水性聚合物。相对于在亲水性聚合物上架起桥梁的感光性树脂组合物,在比其低20重量%以下0.5重量%的分子中,期望使亲水性树脂暴露于所形成的光层。它可以在识别室中处理,不需要显影和擦拭操作,同时在疏水性上也很出色,减少了润湿水的量,并且为CTP提供了难于润滑的基础板。

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