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Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same
Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same
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机译:产生光酸的聚合物,其制备方法和包含该光酸聚合物的顶部抗反射涂料组合物
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摘要
Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; R2 is hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, and d equals one. Since the photoacid generating polymer of Formula 1 is not water-soluble and acts as a photoacid generator, it can be used to prepare a top anti-reflective coating composition for immersion lithography.
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