Lithographic simulations using graphical processing units

摘要

Systems and methods are provided for programming and running simulation engines of lithographic simulations on GPUs. This integration of lithographic simulations includes the hosting on one or more GPUs of any of a variety of lithographic techniques, including for example resolution enhancement technologies, optical proximity correction, optical rule-checking or lithography checking, and model-based DRC, where operations of one or more techniques are run in parallel. The systems and methods provided also include the integration of lithographic geometry operations into GPUs to obtain improved performance. Examples of this integration include a Design Rule Checker (DRC), parasitic extraction, and placement and route for example.