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Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method

机译:温度/厚度测量装置,温度/厚度测量方法,温度/厚度测量系统,控制系统和控制方法

摘要

In the apparatus according to the present invention, light from a light source is split into measurement light and reference light, the optical path length of the reference light is altered and a plurality of measurement light interference waveforms resulting from the interference of measurement beams reflected at a measurement target and the reference light are measured. One of these interference waveforms is designated as a reference interference waveform, another interference waveform corresponding to a measurement beam reciprocally reflected at the two end surfaces of the measurement target twice more than the measurement beam corresponding to the reference interference waveform is designated as a selected interference waveform, the optical path length of the measurement light indicated by the distance between the two end surfaces of the measurement target is measured based upon these interference waveforms. The temperature of the measurement targets is determined in correspondence to the optical path length.
机译:在根据本发明的设备中,来自光源的光被分成测量光和参考光,参考光的光路长度被改变,并且由于在以下位置反射的测量光束的干涉而产生多个测量光干涉波形。测量目标和参考光。将这些干扰波形中的一个指定为参考干扰波形,将与在测量目标的两个端面上往复反射的测量光束相对应的另一干扰波形指定为参考干扰波形,该另一干扰波形被指定为选择干扰。在该波形中,基于这些干涉波形来测量由测量对象的两个端面之间的距离表示的测量光的光路长度。对应于光路长度来确定测量目标的温度。

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