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Heterogeneous composite semiconductor structures for enhanced oxide and air aperture formation for semiconductor lasers and detectors and method of manufacture

机译:用于增强半导体激光器和检测器的氧化物和气孔形成的异质复合半导体结构及其制造方法

摘要

The present invention creates oxide and air apertures in material systems, such as InP, that do not usually accommodate epitaxial incorporation of highly oxidizing materials, such as AlAs, of sufficient thickness to adequately provide optical as well as current aperturing. A composite structure of relatively slowly oxidizing layer or layers (e.g. AlInAs on InP) with a faster-oxidizing layer or layers (e.g. AlAs on InP) can be used to produce oxide and air apertures of various shapes and sizes, and to also increase the oxidation rate.
机译:本发明在诸如InP的材料系统中产生氧化物和空气孔,它们通常不适应外延掺入足够厚度的,足以提供光学和电流开孔的高度氧化性材料,例如AlAs。相对较慢的一个或多个氧化层(例如InP上的AlInAs)与一个或多个快速氧化层(例如InP上的AlAs)的复合结构可用于产生各种形状和尺寸的氧化物和空气孔,并增加氧化速率。

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