首页>
外国专利>
Apparatus and method for reducing the electron-beam-induced deposition of contamination products
Apparatus and method for reducing the electron-beam-induced deposition of contamination products
展开▼
机译:用于减少电子束诱导的污染产物沉积的设备和方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
In a device for examining a specimen with an electron beam, in particular an SEM, TEM, or CSEM, contamination products are often result from the irradiation. To reduce these contamination products, the surface of the object irradiated with the electron beam is simultaneously illuminated with light, in particular with UV light.
展开▼