首页> 外国专利> Mask e.g. photo mask, fabricating process for e.g. antenna, involves thermoforming sheets to obtain mask by separating, on thickness of one sheet and by laser removal, etching or sand blasting, of windows opening on another sheet

Mask e.g. photo mask, fabricating process for e.g. antenna, involves thermoforming sheets to obtain mask by separating, on thickness of one sheet and by laser removal, etching or sand blasting, of windows opening on another sheet

机译:面膜光掩膜,例如天线,涉及热成型薄片以通过在一块薄片的厚度上分开并且通过激光去除,蚀刻或喷砂来分离在另一薄片上开口的窗口来获得掩模

摘要

The process involves disposing a sheet (5) opposite to a cavity of a rigid mold reproduced identical to a three dimensional dielectric substrate. The sheet is covered with a sheet (6). The sheets are thermoformed to obtain a mask (7). The mask is obtained by separating, on the entire thickness of the sheet (5) and by laser removal, etching or sand blasting, of windows (8) which open on the sheet (6) and correspond to functional units. POLYMERS - The sheets are made of plastic materials that are selected from polyacrylic compounds such as methyl polymethacrylate, styrenic compounds such as copolymers of acrylonitrile-butadiene and high-impact polystyrene, polyolefins such as polyethylene or polypropylene, polyvinyl chloride, polycarbonate and polyester.
机译:该方法包括将片材(5)放置在与刚性模具的模腔相对的位置上,该刚性模具的模腔与三维电介质衬底相同。该薄片被薄片(6)覆盖。将片材热成型以获得掩模(7)。通过在片材(5)的整个厚度上分离并且通过激光去除,蚀刻或喷砂来获得在片材(6)上打开并对应于功能单元的窗口(8),从而获得掩模。聚合物-片材由塑料材料制成,这些材料选自聚丙烯酸酯化合物(如聚甲基丙烯酸甲酯),苯乙烯化合物(如丙烯腈-丁二烯与高抗冲聚苯乙烯的共聚物),聚烯烃(如聚乙烯或聚丙烯),聚氯乙烯,聚碳酸酯和聚酯。

著录项

  • 公开/公告号BE1016048A3

    专利类型

  • 公开/公告日2006-02-07

    原文格式PDF

  • 申请/专利权人 SEMIKA S.A.;

    申请/专利号BE20040000088

  • 发明设计人

    申请日2004-02-17

  • 分类号G03F7/24;G03F1/00;G03F1/14;H05K3/00;

  • 国家 BE

  • 入库时间 2022-08-21 21:40:27

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号