A method and apparatus for measurement of chromatic aberations of optical systems

摘要

Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target (64) having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The difference of the edge images generated by the optical system (60) when illuminated by the first illumination and the second illumination measured in a predefined plane represents the optical artifact.