Optical exposing system for use with coating/developing system, has wafer handler for moving wafer to heater after moving wafer from exposure chamber and for moving wafer to different cassette after baking wafer

摘要

The system has a wafer handler configured to move a wafer from an interface chamber (85) through a port into an exposure chamber (87). The handler moves the wafer from the chamber (87) to the chamber (85). The handler moves the wafer to a post exposure bake heater after moving the wafer from the chamber (87). The handler moves the wafer to different cassette after baking the wafer. An independent claim is also included for a method of patterning photoresist on an integrated circuit wafer.