首页> 外国专利> A MECHANISM FOR THE ELECTROCHEMICAL WITHDRAWING CUPRUM (II) IONS FROM USED SOLUTIONS OF COPPER ETCHING

A MECHANISM FOR THE ELECTROCHEMICAL WITHDRAWING CUPRUM (II) IONS FROM USED SOLUTIONS OF COPPER ETCHING

机译:从铜蚀刻中使用的溶液中电化学提取铜离子的机理

摘要

A mechanism for the electrochemical withdrawing cuprum (II) ions from used solutions of copper etching involves bath divided by ion exchange membrane, at that one part of the bath is equipped with cathode bar having cathode, and the second part is equipped with anode bar and insoluble anode. Additionally it contains disposed below the cathode tray of non-current-conductive, acid-resistant material the internal part of which is covered with sheet copper with fixed conductor for connecting to the direct current voltage source.
机译:从用过的铜蚀刻溶液中电化学提取铜离子的机理包括浴被离子交换膜分开,在浴的一部分上装有带有阴极的阴极棒,第二部分上装有阳极棒,不溶阳极。此外,它还包含位于非导电,耐酸材料的阴极托盘下方,该材料的内部覆盖有带有固定导体的铜片,用于连接到直流电压源。

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