INDUCTION FULLERENE PRODUCING DEVICE AND PRODUCING METHOD AND INDUCTION FULLERENE

摘要

A device and a method for producing induction fullerene with high yield. Nitrogen gas, an object to be induced, is introduced into a plasma flow producing chamber and a high-temperature plasma flow forming chamber to form a high-temperature plasma flow consisting of nitrogen ions and electrons. A grid (105) is applied with a negative voltage to keep low electron energy in the high-temperature plasma flow. Then, fullerene introduced from a fullerene sublimating oven (107) is allowed to collide with electrons to bond electrons to fullerene to be ionized. A recovering cylinder (112) is disposed in an induction fullerene accumulating chamber so as to enclose a plasma flow. In this induction fullerene accumulating chamber, induction fullerene such as nitrogen-substitution hetero fullerene and nitrogen-included fullerene is produced and deposited on the recovering cylinder (112).