首页> 外国专利> APPLICATION APPARATUS HAVING CLEANING MECHANISM, METHOD FOR CLEANING APPLICATION APPARATUS AND CLEANING MECHANISM FOR USE IN APPLICATION APPARATUS

APPLICATION APPARATUS HAVING CLEANING MECHANISM, METHOD FOR CLEANING APPLICATION APPARATUS AND CLEANING MECHANISM FOR USE IN APPLICATION APPARATUS

机译:具有清洁机构的应用设备,清洁应用设备的方法和用于应用设备的清洁机制

摘要

An application apparatus (1) which comprises a cleaning mechanism (3) having a piping (12 to 14) in which an application fluid flows, a die head (9) provided in the piping (12 to 14) and a plurality of solvent tanks (22a to 22d) for storing solvents of types different from one another. The cleaning mechanism (3) supplies solvents stored in the above solvent tanks (22a to 22d) to the above piping (12 to 14), in such a manner that a solvent compatible with the above application fluid is first supplied and then it is gradually changed to a solvent having a higher detergency, to thereby clean the inside of the piping (12 to 14) and the inside (9a, 9b) of the die head (9).
机译:一种涂布装置(1),其包括清洁机构(3),该清洁机构具有在其中流动有涂布液的管道(12至14),设置在该管道(12至14)中的模头(9)和多个溶剂罐(22a至22d)用于存储彼此不同类型的溶剂。清洁机构(3)以如下方式将存储在上述溶剂罐(22a至22d)中的溶剂供应至上述管道(12至14),即,首先供应与上述涂布液相容的溶剂,然后逐渐地将其溶解。将其更换为具有较高去污力的溶剂,从而清洁管道(12至14)的内部以及模头(9)的内部(9a,9b)。

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