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METHOD AND SYSTEM FOR FINDING AN EQUIVALENT CIRCUIT REPRESENTATION FOR ONE OR MORE ELEMENTS IN AN INTEGRATED CIRCUIT

机译:用于为集成电路中的一个或多个元素寻找等效电路表示的方法和系统

摘要

The present invention provides a method and a system for designing an integrated circuit comprising a plurality of elements. The method includes obtaining a lithography-­simulated layout corresponding to at least one element. The lithography-simulated layout accounts for lithography effects on the element. The method further includes determination of an equivalent circuit representation that is compatible to a circuit analysis tool, corresponding to the lithography-simulated layout with respect to one or more performance characteristics and based on user preferences. The method also provides equivalent circuit representation to the circuit analysis tool that analyzes one or more performance characteristics of the elements.
机译:本发明提供了一种用于设计包括多个元件的集成电路的方法和系统。该方法包括获得与至少一个元素相对应的光刻模拟布局。光刻模拟的布局说明了光刻对元素的影响。该方法进一步包括确定相对于一个或多个性能特征并基于用户偏好的,与光刻模拟的布局相对应的,与电路分析工具兼容的等效电路表示。该方法还向电路分析工具提供等效电路表示,该电路分析工具分析元件的一个或多个性能特征。

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