首页> 外国专利> APPARATUS AND METHOD OF INSPECTING DENSITY UNEVENNESS AND RECORDING MEDIUM CARRYING A PROGRAM FOR INSPECTING DENSITY UNEVENNESS

APPARATUS AND METHOD OF INSPECTING DENSITY UNEVENNESS AND RECORDING MEDIUM CARRYING A PROGRAM FOR INSPECTING DENSITY UNEVENNESS

机译:检验密度不均和记录介质的装置和方法携带检验密度不均的程序

摘要

PPROBLEM TO BE SOLVED: To improve the accuracy of uneveness inspection near edges, in the uneveness inspection for inspecting the density uneveness of an object of interest. PSOLUTION: In this uneveness inspection device 1 for inspecting density uneveness of a resist applied onto a substrate 9, low-pass filter processing is performed after an imaged image of the substrate 9 is compressed, and then high-pass filter processing is performed by a high-pass filter part 4214. In the high-pass filter part 4214, when a high-pass window exists near an edge, the high-pass window is reduced, and a region other than the region to which a noted pixel as an object for pixel value calculation by filter processing belongs, is avoided. In the uneveness inspection device 1, by restricting the pixel group used for the high-pass filter processing to the pixels in the high-pass window, namely, pixels inside the region to which the target pixel substantially belongs, accuracy of uneveness inspection near the edge is improved. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:为了提高边缘附近的不均匀检查的准确性,在不均匀检查中检查目标物体的密度不均匀。

解决方案:在该不均匀性检查装置1中,用于检查施加到基板9上的抗蚀剂的浓度不均匀性,然后在对基板9的成像图像进行压缩之后进行低通滤波处理,然后进行高通滤波处理。由高通滤波器部分4214执行。在高通滤波器部分4214中,当高通窗口在边缘附近存在时,高通窗口减小,并且除了注目像素的区域之外的区域也减小。避免了通过滤波处理来计算像素值的对象所属于的对象。在非均质检查装置1中,通过将用于高通滤波处理的像素组限制为高通窗中的像素,即目标像素实质上所属的区域内的像素,从而能够在非均质检查装置1中对非均质检查装置的精度进行校正。边缘得到改善。

版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号KR20060052001A

    专利类型

  • 公开/公告日2006-05-19

    原文格式PDF

  • 申请/专利权人 DAINIPPON SCREEN MFG. CO. LTD.;

    申请/专利号KR20050092942

  • 发明设计人 UETA KUNIO;TANIGUCHI KAZUTAKA;

    申请日2005-10-04

  • 分类号H01J9/42;

  • 国家 KR

  • 入库时间 2022-08-21 21:25:45

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