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CERIUM SALT, PROCESS FOR PRODUCING THE SAME, CERIUM OXIDE, AND CERIUM-BASED ABRASIVE MATERIAL

机译:铈盐,氧化铈的生产工艺,氧化铈和铈基磨料

摘要

A cerium salt which, when dissolved in an amount of 20 g in a liquid mixture of 12.5 g of 6 N nitric acid and 12.5 g of 30% aqueous hydrogen peroxide solution, gives a solution in which the concentration of insolubles present therein is up to 5 ppm by mass of the cerium salt before dissolution; and a cerium oxide obtained by treating the cerium salt with a high temperature. The amount of impurities contained in cerium oxide particles and cerium salt particles to be used as a raw material for the cerium oxide is reduced to heighten the purity. Due to the purification, when a cerium-based abrasive material containing these cerium oxide particles is used in polishing, the surface being polished can be made less apt to suffer scratching.
机译:一种铈盐,当以20克的量溶解在12.5克的6 N硝酸和12.5克的30%过氧化氢水溶液的液体混合物中时,得到的铈盐溶液中的不溶物浓度最高为溶解前的铈盐质量为5 ppm;通过高温处理铈盐得到的氧化铈。减少了用作氧化铈原料的氧化铈颗粒和铈盐颗粒中所含杂质的量,以提高纯度。由于纯化,当将包含这些二氧化铈颗粒的铈基磨料用于抛光时,可以使被抛光的表面不易刮擦。

著录项

  • 公开/公告号KR20060061370A

    专利类型

  • 公开/公告日2006-06-07

    原文格式PDF

  • 申请/专利权人 HITACHI CHEMICAL COMPANY LTD.;

    申请/专利号KR20067004634

  • 发明设计人 CHINONE KANSHI;MIYAOKA SEIJI;

    申请日2006-03-07

  • 分类号C01F17;C09K3/14;

  • 国家 KR

  • 入库时间 2022-08-21 21:25:36

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