PHOTORESIST COMPOSITION FOR COLOUR FILTER AND PREPARATION METHOD OF LIQUID CRYSTAL DISPLAY COLOUR FILTER USING THE SAME

摘要

PPROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter which minimizes unnecessary parts occurring at the peripheral edge of a resist film spin-coated on a substrate in an LCD manufacturing process by a TFT and STN system, and which improves coating property and planarization. PSOLUTION: The photosensitive resin composition for a color filter contains one or more silicon-based surface additives selected from the group consisting of: polyalkylene oxide methylsilane polymers; polyether modified dimethylpolysiloxane polymer solutions; and polyether modified dimethylpolysiloxane polymers. PCOPYRIGHT: (C)2006,JPO&NCIPI