首页> 外国专利> REFINING METHOD OF COPPER CHLORIDE ETCHING WASTE FLUID AND REFINED COPPER CHLORIDE SOLUTION

REFINING METHOD OF COPPER CHLORIDE ETCHING WASTE FLUID AND REFINED COPPER CHLORIDE SOLUTION

机译:氯化铜蚀刻废液的精制方法和精制的氯化铜溶液

摘要

The invention is to refine a copper chloride etching waste liquid after etching a copper material by removing impurity metals other than copper which is effective metal with a simple operation. An anionic complex of metal, such as zinc and iron, is known to be removed by bringing the same into contact with a weak anionic exchange resin. The copper which is the effective metal in the copper chloride waste liquid is said to exist as the anionic complex. The inventor found that the anionic complex of the copper in the copper chloride etching waste liquid is substantially not adsorbed even if the complex is brought into contact with the strong or weak basic anionic exchange resin. Accordingly, by bringing the copper chloride etching waste liquid into contact with these anion exchange resins, the anionic complex of the iron or the zinc is adsorbed in the resins and is thereby removed but since the copper remains as it is in the liquid, the copper chloride etching waste liquid can be refined.
机译:本发明是通过以简单的操作除去作为有效金属的铜以外的杂质金属来精制蚀刻铜材料后的氯化铜蚀刻废液。已知通过使金属与弱阴离子交换树脂接触,可以除去金属的阴离子络合物,例如锌和铁。据说作为氯化铜废液中的有效金属的铜作为阴离子络合物存在。发明人发现,即使使氯化铜蚀刻废液中的铜的阴离子络合物与强或弱碱性阴离子交换树脂接触,也基本上不吸附该络合物。因此,通过使氯化铜蚀刻废液与这些阴离子交换树脂接触,铁或锌的阴离子络合物被吸附在树脂中并被除去,但是由于铜原样残留在液体中,因此铜氯化物蚀刻废液可以提纯。

著录项

  • 公开/公告号KR20060105530A

    专利类型

  • 公开/公告日2006-10-11

    原文格式PDF

  • 申请/专利权人 TSURUMISODA CO. LTD.;

    申请/专利号KR20060028679

  • 发明设计人 MATSUKI SHIROSHI;

    申请日2006-03-30

  • 分类号C23F1/46;

  • 国家 KR

  • 入库时间 2022-08-21 21:24:51

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