RING FIELD-4-MIRROR SYSTEMS WITH CONVEX PRIMARY-MIRROR FOR THE EUV-LITHOGRAPHY

摘要

The invention particularly relates to the reduction objective for microlithography EUV- , the objective lens is ; - the optical axis for the arrangement of four multi-layer mirror , the beam in order a first mirror disposed in the path , the second mirror , the third mirror , and a fourth mirror , ; - includes a ring field for the scanning operation , ; -. the obscuration (obscuration) including without light guide ; the present invention ; - the first convex mirror , ; -. and the positive features of a chief ray angular magnification of the second mirror