Fabrication Method of a Mask for X-ray Lithography

摘要

X-ray mask manufacturing method according to the present invention is a first step of applying an absorbing layer on the membrane of the X-ray mask and forming a PR pattern on one surface of the absorbing layer, the second step of etching the absorbing layer according to the PR pattern, the etching of the absorbing layer And a fourth step of removing by-products accumulated in the portion and a fourth step of depositing a protective film on the sidewall of the absorber layer, wherein the second to fourth steps are repeated one or more times.