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SEMICONDUCTOR DEVICE WHICH HAS PARTIAL SOI STRUCTURE OR PARTIAL SON STRUCTURE

机译:具有部分SOI结构或部分SON结构的半导体器件

摘要

A semiconductor device includes first and second semiconductor layers and first and second MOS transistors. The first semiconductor layer is provided on and electrically connected to the semiconductor substrate. The second semiconductor layer is provided near the first semiconductor layer and formed above the semiconductor substrate via one of an insulating film and a cavity. The first and second MOS transistors are respectively provided on the first and second semiconductor layers, and each has a gate electrode arranged parallel to a boundary between the first and second semiconductor layers.
机译:半导体器件包括第一和第二半导体层以及第一和第二MOS晶体管。第一半导体层设置在半导体衬底上并电连接到半导体衬底。第二半导体层设置在第一半导体层附近,并且经由绝缘膜和空腔中的一个形成在半导体衬底上方。第一和第二MOS晶体管分别设置在第一和第二半导体层上,并且每个都具有平行于第一和第二半导体层之间的边界布置的栅电极。

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