Device Manufacturing Method, Mask Set for use in the Method, Data Set for Controlling a Programmable Patterning Device, Method of Generating a Mask Pattern and a Computer Program

摘要

Isolated dark features, e.g. contact holes or lines, are exposed in a double exposure, using for example a box-in-box pattern (Fig.2C and Fig.2D), and using different illumination settings in the two exposures. IMAGE IMAGE IMAGE IMAGE