首页> 外国专利> Thermal element production. used in semiconductor process technology, comprises forming layer sequence elements by applying an electrically insulating layer on a substrate and further processing

Thermal element production. used in semiconductor process technology, comprises forming layer sequence elements by applying an electrically insulating layer on a substrate and further processing

机译:热敏元件生产。用于半导体工艺技术的方法包括通过在基板上施加电绝缘层并进一步处理来形成层序列元素

摘要

Production of a thermal element comprises forming several layer sequence elements by applying an electrically insulating layer on a substrate, forming a thermocouple on the electrically insulating layer, removing the substrate, applying layer sequence elements on each other and electrically connecting together to form the thermal element. The thermocouple consists of a first thermocouple material and a second thermocouple material having different Seebeck coefficients.
机译:热元件的生产包括通过在基板上施加电绝缘层,在电绝缘层上形成热电偶,移除基板,在彼此上施加层序列元件并电连接在一起以形成热元件来形成多个层序元件。 。热电偶由具有不同塞贝克系数的第一热电偶材料和第二热电偶材料组成。

著录项

  • 公开/公告号DE102004030043A1

    专利类型

  • 公开/公告日2006-01-12

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20041030043

  • 发明设计人 LAUTERBACH CHRISTL;STRASSER MARC;

    申请日2004-06-22

  • 分类号H01L35/34;H01L35/32;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:52

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