A process for the crystal orientation of measurement by means of x-ray radiation and device for the crystal orientation measurement by means of x-ray radiation

摘要

A process for the crystal orientation measurement by means of x-rays, having the following steps:– Broadcasting of continuous x-rays to a measuring surface of a crystal to be measured in a predetermined angle and– Detecting a by means of the emission of the continuous x-ray diffraction pattern obtained in accordance with a lattice plane of the crystal by means of a two - dimensional detector (60),characterized by the steps of– Measuring a central position exclusively of a central diffraction point of the diffraction image andCalculating a normal of the lattice plane of the crystal on the basis of the position of the central bending point for determining the orientation of the measuring surface of the crystal.