首页> 外国专利> Optically active structure application method for Fresnel lens manufacture, involves photographic structuring photosensitive resist layer, coating substrate with optically active layer and lifting-off resist layer

Optically active structure application method for Fresnel lens manufacture, involves photographic structuring photosensitive resist layer, coating substrate with optically active layer and lifting-off resist layer

机译:用于菲涅耳透镜制造的光学活性结构的应用方法,涉及照相结构化感光抗蚀剂层,具有光学活性层的涂层基材和剥离抗蚀剂层

摘要

The method involves coating a substrate (1) with a photosensitive resist layer and carrying-out photographic structuring of the resist layer. The pre-structured substrate is coated with an optically active layer comprising glass and metal, by electron beam physical vapor deposition (E-beam PVD) and the resist layer is lifted-off. Independent claims are also included for the following: (1) optically active element; (2) optically active component; and (3) hybrid lens.
机译:该方法包括用光敏抗蚀剂层涂覆基材(1),并对抗蚀剂层进行照相结构化。通过电子束物理气相沉积(电子束PVD),用含玻璃和金属的光学活性层涂覆预结构化的基底,并剥离抗蚀剂层。还包括以下方面的独立权利要求:(1)光学活性元件; (2)光学活性成分; (3)混合镜片。

著录项

  • 公开/公告号DE102004059252A1

    专利类型

  • 公开/公告日2006-01-19

    原文格式PDF

  • 申请/专利权人 SCHOTT AG;

    申请/专利号DE20041059252

  • 发明设计人 MUND DIETRICH;HAMMERL KLAUS MICHAEL;

    申请日2004-12-08

  • 分类号G03F7/00;G02B3/00;G02B1/10;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:34

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